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High-purity baked lining for electronic materials

Leave the challenges related to high-purity photoresist liquid manufacturing equipment to Japan Fluorochemical Industry!

Applying fluororesin lining to photoresist liquid manufacturing equipment is expected to provide the following benefits: 1. Improved high purity: It is expected to prevent the leaching of metal ions and enhance purity. 2. Enhanced liquid drainage: Due to its high water repellency, it is expected to reduce the residue of products and cleaning solutions, leading to improved quality and reduced production costs. 3. Chemical resistance: It is expected to protect the substrate from corrosion caused by chemicals, thereby extending the lifespan of the substrate. 4. Prevention of wear particle contamination: By selecting our non-metal PEC specifications, it is expected to prevent the contamination of wear particles generated from the shaft seal of the stirrer. Additionally, there is an antistatic specification that lowers the leakage resistance value of the fluororesin insulating film, allowing static electricity generated during stirring to dissipate in the volume direction, which is expected to prevent explosions and damage to the film and equipment caused by static electricity.

  • Resist Device
  • High purity baked lining

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